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Thermal Graphene Film Graphitization Furnace(Horizontal)

Thermal graphene film graphitization furnace can be used for high-temperature graphitization of various carbon and graphite materials, especially for graphite block, graphite flake, graphite rod and graphite tubular to make anisotropic graphite with ordered graphite crystal structure.

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Applications:

Thermal graphene film graphitization furnace can be used for high-temperature graphitization of various carbon and graphite materials, especially for graphite block, graphite flake, graphite rod and graphite tubular to make anisotropic graphite with ordered graphite crystal structure. It is widely used in the graphitization of thermal graphene film industry.

Max Working Temperature

3000°C

Max. Loading Capacity

339

Temperature Uniformity

±10°C

Heating Power

250 KW

Supply Voltage

3P, 380V, 50Hz/60Hz

Working Atmosphere

High Vacuum (Optional) / Vacuum / Inert Gas (Ar or N2)

Features

Chamber Options:Single or Multi-chamber
Working Temperature: up to 3000°C
Heating method: Medium frequency induction
Temperature Uniformity: ±10°C
Furnace Type: Horizontal, Top loading, Bottom loading
Atmosphere: Vacuum, N2, Ar

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