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Thermal Graphene Film Graphitization Furnace(Bottom loading)

Thermal graphene film graphitization furnace can be used for high-temperature graphitization of various carbon and graphite materials, especially for graphite block, graphite flake, graphite rod and graphite tubular to make anisotropic graphite with ordered graphite crystal structure.

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Applications:

Thermal graphene film graphitization furnace can be used for high-temperature graphitization of various carbon and graphite materials, especially for graphite block, graphite flake, graphite rod and graphite tubular to make anisotropic graphite with ordered graphite crystal structure. It is widely used in the graphitization of thermal graphene film industry.

Weight 50 kg
Dimensions 12314 × 321 × 32 cm
Max Working Temperature

test temp

Usable Space (mm) W×H×L

Φ500×1000

Max. Loading Capacity(L)

452L

Temperature Uniformity

±10°C

Supply Voltage

3P, 380V, 50Hz/60Hz

Working Atmosphere

High Vacuum (Optional) / Vacuum / Inert Gas (Ar or N2)
Vacuum and high vacuum atmosphere is only permitted up to 2200°C.

Features

Chamber Options:Single or Multi-chamber
Working Temperature: up to 3000°C
Heating method: Medium frequency induction
Temperature Uniformity: ±10°C
Furnace Type: Horizontal, Top loading, Bottom loading
Atmosphere: Vacuum, N2, Ar

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